Please use this identifier to cite or link to this item: https://hdl.handle.net/10923/21050
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dc.contributor.authorIzete Zanesco-
dc.contributor.authorAdriano Moehlecke-
dc.date.accessioned2022-03-30T15:04:11Z-
dc.date.available2022-03-30T15:04:11Z-
dc.date.issued2016-
dc.identifier.isbn9783981465952-
dc.identifier.urihttps://hdl.handle.net/10923/21050-
dc.language.isopt_BR-
dc.relation.ispartofProceedings of the ISES Solar World Congress 2015, 2015, Brasil.-
dc.rightsopenAccess-
dc.subjectCélulas Solares-
dc.subjectPassivação de superfícies-
dc.subjectÓxido de silício-
dc.titleAnalysis of the Silicon Dioxide Passivation and Forming Gas Annealing in Silicon Solar Cells-
dc.typeconferenceObject-
dc.date.updated2022-03-30T15:04:10Z-
dc.identifier.doiDOI:10.18086/swc.2015.05.01-
Appears in Collections:Apresentação em Evento



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